This Site uses cookies that enable us to make improvements, provide relevant content, and for analytics purposes. For more details, see our Cookie Policy. By clicking Accept, you consent to our use of cookies. To withdraw your consent, click the "Withdraw Cookie Consent" link at the bottom of the webpage at any time.

Products & Services
Company
Contact
Careers

Back to Menu

Products & Services
Company
Contact
Careers

News Release

Multimedia Available: Applied Materials Redefines Dielectric Etch Technology for Advanced Copper/Low k Chip Designs

Jul 2, 2003 at 3:20 PM EDT
PDF Version

--(BUSINESS WIRE)--

Applied Materials Inc. redefines dielectric etch technology with its new Enabler(TM) Centura(R) system, the industry's first production etcher engineered for the complex and demanding requirements of 65nm devices, with extendibility to both future and earlier technologies.

    You can reach the story directly by going to
http://www.newstream.com/cgi-bin/display_story.cgi?9950

This multimedia news story is for free and unrestricted use on your news information site (and for print or broadcast too). Visit http://www.newstream.com to download video, audio, text, graphics and photos.

If you have any questions about the story, or about Newstream.com, please write to us at info@newstream.com.


    CONTACT: Newstream
             info@newstream.com

    SOURCE: Newstream and Applied Materials Inc.