Event Advisory: Leading Technologists to Explore Sub-22nm Flash Memory
Titled “How will NAND Flash Scale Beyond 2X?”, the symposium will feature a stimulating panel discussion with leading technologists from across the flash memory industry. The panel will debate the challenges facing flash scaling and share their vision of how the industry landscape will evolve as we enter a new decade.
Panel: | Yoshio Nishi, Stanford University, Moderator | |
Hideaki Aochi – Toshiba Corp. | ||
Seiichi Aritome – Hynix Semiconductor, Inc. | ||
Siyoung Choi – Samsung Microelectronics, Ltd. | ||
Kirk Prall – Micron Technology, Inc. | ||
Hans Stork – Applied Materials | ||
Where: | Baltimore Marriott Inner Harbor at Camden Yards | |
110 South Eutaw Street, Baltimore, Maryland 21201 | ||
When: | Tuesday, December 8, 2009 | |
Schedule: | 5:15pm-6:15pm Registration and Reception | |
6:15pm-7:30pm Panel Discussion | ||
7:30pm-8:00pm Networking | ||
For more information on this exciting event, please visit: http://www.appliedmaterials.com/sub22nm_panel/.
Source:
Applied Materials, Inc.
Betty Newboe, 408-563-0647 (editorial/media)
Michael
Sullivan, 408-986-7977 (financial community)