SANTA CLARA, Calif.--(BUSINESS WIRE)--Feb. 13, 2009--
Without robust and affordable next-generation lithography, the current
semiconductor roadmap could change dramatically. For 22nm and beyond,
patterning candidates such as EUVL*, nano-imprint, direct
write and optical double patterning methods show promise. But which one
will deliver the best balance of performance and cost? On February 25,
in San Jose, California, Applied Materials will host an important
seminar exploring this critical topic.
Titled “Next Generation Lithography Technologies: Yielding Moore
with Less,” the forum will be led by Dr. Hans Stork, chief technology
officer of Applied Materials’ Silicon Systems Group. The program will
feature an afternoon of technical presentations discussing new
patterning, inspection and metrology techniques and their influence on
lithography. The presentations will be followed by an exploratory look
into the world of 22nm chip design with a live demonstration of
decomposition tools for 22nm sidewall spacer double patterning. Experts
drawn from academia; circuit design; and logic, memory and foundry
manufacturing will round out the program with a spirited debate on
lithography technology for the future.
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Panel:
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Jongwook Kye – AMD, Inc.
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Burn Lin – TSMC, Ltd.
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Steve Radigan – SanDisk Corporation
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Milind Weling – Cadence Design Systems, Inc.
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Grant Willson – University of Texas at Austin
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Ken MacWilliams – Applied Materials, Moderator
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Where:
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The Sainte Claire Hotel,
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302 S Market Street, San Jose, CA 95113
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When:
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Wednesday, February 25, 2009
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Schedule:
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3:00pm-3:30pm
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Registration
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3:30pm-5:00pm
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Seminar program
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5:00pm-5:30pm
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Live demonstration of 22nm sidewall spacer design software
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5:30pm-6:45pm
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Panel discussion
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6:45pm-8:30pm
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Reception
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For more information on this compelling event, please visit www.appliedmaterials.com/2009_SPIE.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in
Nanomanufacturing Technology™ solutions with a broad portfolio of
innovative equipment, service and software products for the fabrication
of semiconductor chips, flat panel displays, solar photovoltaic cells,
flexible electronics and energy efficient glass. At Applied Materials,
we apply Nanomanufacturing Technology to improve the way people live.
Learn more at www.appliedmaterials.com.
*EUVL = extreme ultraviolet lithography
Source: Applied Materials, Inc.
For Applied Materials, Inc.
Connie Duncan, 408-563-6209
(editorial/media)
Michael Sullivan, 408-986-7977 (financial
community)
