Applied Materials Redefines Chip Packaging Productivity with New Charger PVD System
“Packaging facilities need a fast, dependable metallization workhorse to
maximize wafer output and minimize the system redundancy burden imposed
by slower, less reliable alternatives,” said
Key to the Charger platform’s high productivity is its streamlined modular architecture that easily expands from three to five processing stations to sequentially deposit multiple thin films while keeping the wafer in an ultra-clean, ultra-high vacuum environment. Incoming wafers are conditioned using novel Isani wafer treatment technology that ensures a low-resistance, low-contaminant interface between the incoming device and the metal films to be deposited while also delivering excellent defect performance and greatly extended maintenance intervals. Applied’s superior PVD reactor technology can tailor the properties of each film layer for optimum device performance while the flexible architecture enables extendibility to emerging three-dimensional interconnect and packaging technologies.
The Charger UBM system builds on Applied’s two decades of leadership in PVD metallization technology. Applied’s PVD systems are used by virtually all advanced manufacturers around the globe for fabricating chips. For more information, visit www.appliedmaterials.com/products/charger_4.html.
* PVD = physical vapor deposition
Photos/Multimedia Gallery Available: http://www.businesswire.com/cgi-bin/mmg.cgi?eid=5975542&lang=en
Source:
Applied Materials, Inc.
Betty Newboe, 408-563-0647 (editorial/media)
Michael
Sullivan, 408-986-7977 (financial community)