Applied Materials Introduces Enabling Polysilicon CMP Process for Next-Generation Devices
SANTA CLARA, Calif.--(BUSINESS WIRE)--Sept. 14, 1999--
New Mirra Polysilicon CMP Process Targets Manufacturing
Challenges of Sub-0.18 Micron Transistors
Applied Materials, Inc. (Nasdaq:AMAT), the leading supplier of CMP (chemical mechanical polishing) systems to the semiconductor industry, today introduced a production-worthy polysilicon (poly) CMP process to enable high-performance sub-0.18 micron capacitor and transistor device designs.
The proprietary Mirra(R) Polysilicon CMP process, already
accepted at a number of advanced logic and DRAM fabs, provides the
industry with a precise technology for forming polysilicon capacitor,
gate and contact device structures.
"Our Mirra Polysilicon CMP process is an attractive solution for
sub-0.18 micron device designs because of its ability to precisely
planarize polysilicon films," said Chris Smith, vice president and
general manager of Applied Materials' CMP division.
"As a relatively new CMP application, advanced chipmakers have
had to use internally developed poly CMP processes. To enable the
mainstream implementation of this advanced technology, we have
leveraged the proven advantages of our Mirra CMP system to develop the
industry's first turnkey polysilicon CMP process."
Market researcher Dataquest forecasts the market for CMP
polysilicon applications will grow from $28 million in 1999 to $107
million by 2003, representing a compounded annual growth rate of 40
percent over the four year period. Based on customer information,
Applied Materials estimates that poly CMP can be used in up to four
layers of some advanced DRAM devices. Applications for polysilicon CMP
technology are expected to increase because they enable the formation
of scaled-down capacitor and transistor gate structures as well as
polysilicon contact plugs.
Mirra Polysilicon CMP is a two-slurry, multi-step process that
provides customers with repeatable removal uniformity across the
wafer, low defect counts for high device yield and minimal dopant loss
to ensure device performance and high yield. Enabling this superior
process performance is a production-proven system with capabilities
that are unique to the Mirra system and critical to poly CMP.
The Mirra's flexible three platen design is ideally suited for
addressing key issues of removal non-uniformity, defects and dopant
loss. First, to achieve consistent uniformity, a non-selective slurry
removes the layer of cap oxide that grows on the poly surface. This
"oxide breakthrough" polish step is followed by bulk removal of the
poly layer using a different high-removal rate, high-selectivity
(polysilicon:oxide) slurry until the endpoint is reached. The process
continues using a non-selective slurry for overpolishing, to minimize
dishing which could diminish device performance. Once polishing is
complete, a separate step cleans and re-oxidizes the polysilicon
surface to limit dopant loss. By allowing sequential multi-step
processing, the Mirra maintains high throughput.
The Mirra's Titan Head(TM) polishers enable a low pressure
process that is a major factor in the uniform, consistent removal rate
exhibited by the Mirra Polysilicon CMP process. Combining this low
pressure processing capability with a non-selective slurry for
overpolish and an advanced CMP rinse solution also offers excellent
defect performance for high yielding results. A complete, fully
automated dry-in/dry-out post-CMP cleaning process using the Mirra
Mesa(TM) integrated CMP solution contributes to tight particle
control.
The Mirra's In Situ Rate Monitor (ISRM(TM)) endpoint technology
repeatably controls overpolishing to minimize erosion and dishing
effects. It accurately identifies the point at which the polysilicon
has been completely removed to end polishing, thereby limiting the
loss of polysilicon in the plug, contacts and trenches. Given the
accuracy of ISRM endpointing, the need for a typical sacrificial
nitride stop layer can be eliminated, offering a simplified and
potentially lower cost production process.
Applied Materials, Inc. is a Fortune 500 global growth company
and the world's largest supplier of wafer fabrication systems and
services to the global semiconductor industry. Applied Materials is
traded on the Nasdaq National Market System under the symbol "AMAT."
Applied Materials' web site is http://www.appliedmaterials.com.
--30--aj/sf* CONTACT: Applied Materials, Inc. Connie Duncan, 408/563-6209 (Editorial/Media) Carolyn Schwartz, 408/748-5227 (Financial Community) KEYWORD: CALIFORNIA INDUSTRY KEYWORD: COMPUTERS/ELECTRONICS COMED PRODUCT